2016年5月17日星期二

25mm diameter by 3mm length Ta targe Tantalum Sputtering Target Sunrise Metal is a factory for Tantalum,Niobium, Tungsten,Molybdenum,Titanium, Zirconium.Chromium,Nickel,Aluminium Hfnium semiproducts and their alloys Shenzhen Sunrise Metal Industry Co.,Ltd 0086-0755-27185042 http://www.sunriseta.com sales@sunriseta.com skype :Li.mary9 QQ :1957953030 wahtsapp: 15919982500

 25mm diameter by 3mm length Ta targe Tantalum Sputtering Target Sunrise Metal is a factory  for Tantalum,Niobium, Tungsten,Molybdenum,Titanium, Zirconium.Chromium,Nickel,Aluminium Hfnium semiproducts and their alloys
Shenzhen Sunrise Metal Industry Co.,Ltd
skype :Li.mary9
QQ :1957953030
wahtsapp: 15919982500Ta target: dia.25*t3
QTY: 1pc
CIF price: 25usd/pc
Delivery time: 25days
Validity: 10days

PRODUCT INFORMATION TANTALUM SPUTTERING TARGETS

ANTALUM SPUTTERING TARGETS

Shenzhen Sunrise Metal Industry Co.,Ltd is well-known as a major international producer of tantalum products for the electronic, semiconductor and industrial markets.
Tantalum ingots are electron beam (EB) melted, and have inherently high purity due to a combination of high vacuum settings, slow melting rates, multiple furnace passes, and careful control of all aspects of the process.
 tantalum-sputtering-target_hc-starck.jpg
Tantalum Sputtering Target
Application
Tantalum sputtering targets make thin coatings via a sputtering process for copper interconnect metallization, magnetic recording media, printer components, flat panel displays, optical and industrial glass, and thin film resistors.
Dimensions
Shenzhen Sunrise Metal Industry Co.,Ltdsupplies both blanks and finished tantalum plates to manufacturers of sputtering targets. These targets meet exacting standards of purity and dimensional tolerances. Target blank sizes range from small research cathodes to large 100 pound planar targets. Typical thicknesses include .2" to .7", but thickness can be up to 1.5" and greater. Typical diameters are 3" to 18". Typical rectangles are 6" to 30" or larger based on customer needs.
Typical Tantalum Properties
Shenzhen Sunrise Metal Industry Co.,Ltdoffers a variety of options for texture controlled plates that lead to uniform thin film deposition characteristics throughout the target life.
Electron beam (EB) melted, cross rolled, rolled and annealed:
Density: 0.6 lb/in3 or 16.6 g/cm3
Atomic Number: 73
Atomic Weight: 180.95
Purity: See chemistries below:

Elements
3N5 Purity
99.95% Ta
3N8 Purity
99.98% Ta

Max. ppmMax. ppm
Al105
Ca105
Cl33
Co105
Cr105
Cu55
Fe5020
K22
Li11
Mg105
Mn105
Mo5020
Na11
Nb300100
Ni2010
Pb55
Si1010
Sn105
Ti105
V55
W150100
Zn55
Zr2010
Max Total
Detectable Metallics

500

200

INTERSTITIALS
C4040
O100100
H1010
N4020
S1010
Tolerances
Thickness: 
Rolled and leveled plates have a normal thickness tolerance of ± 5% which can be tightened to ± .010" at an added cost, depending on dimensions required.

Flatness: 
.005" - .010" TIR, depending on size and thickness

Grain Size: 
ASTM 4 or finer for targets made from plates under .4" thick.

High Purity Tantalum Chemistries
There is a choice of purity levels with different prices and availability. Purity is measured by DC Plasma and gasses are measured by Leco analyzers. More detailed testing by GDMS (Glow Discharge Mass Spectrometry) is available.
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Water jet cut edge
(cut tolerance +0.060" - 0")

Sheared edge
(cut tolerance +1/8" - 0")
 Water jet cut (top) and machined edge
(tolerance ±.010")

Conflict-free, Sustainable Tantalum Supply

Shenzhen Sunrise Metal Industry Co.,Ltd only processes raw materials from ethically acceptable, conflict-free sources. This also applies for the procurement and processing of tantalum. We only purchase raw materials that meet the specifications of the OECD ("Due Diligence Guidelines for Supply Chains of Minerals from Conflict-Affected and High-Risk Areas"). Our company and its tantalum processing sites are certified in the context of the Conflict-Free Smelter (CFS) Validation Program of the independent Electronics Industry Citizenship Coalition (EICC) and the Global e-Sustainability Initiative (GeSI).
















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